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RESEARCH PAPER · Nature Electronics · 2018

Metrology for the next generation of semiconductor devices

Ndubuisi G. Orji, Mustafa Badaroglu, B. M. Barnes, C. Beitia, B. D. Bunday, Umberto Celano, R. Joseph Kline, Mark O. Neisser, Yaw S. Obeng, András E. Vladár

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Metrology for the next generation of semiconductor devicesOriginalMetrology of Nanostructures by Tomographic Mueller-Matrix Scatterometry9Review—Beyond the Highs and Lows: A Perspective on the Future of Dielectrics Research for Nanoelectronic Devices30Electron beam metrology for advanced technology nodes10Estimating Step Heights from Top-Down SEM Images17Self-Doping Memristors with Equivalently Synaptic Ion Dynamics for Neuromorphic Computing54Ice lithography for 3D nanofabrication70Optical inspection of nanoscale structures using a novel machine learning based synthetic image generation algorithm29Data-driven approaches to optical patterned defect detection12Expanded area metrology for tip-based wafer inspection in the nanomanufacturing of electronic devices10Three-dimensional imaging of integrated circuits with macro- to nanoscale zoom185Characterizing profile tilt of nanoscale deep-etched gratings via x-ray diffraction11Deep-ultraviolet integrated photonic and optoelectronic devices: A prospect of the hybridization of group III–nitrides, III–oxides, and two-dimensional materials45Machine Learning in Nanoscience: Big Data at Small Scales229Impact of process variability in junctionless FinFETs due to random dopant fluctuation, gate work function variation, and oxide thickness variation16Extracting dimensional parameters of gratings produced with self-aligned multiple patterning using grazing-incidence small-angle x-ray scattering12Hardware Trust and Assurance through Reverse Engineering: A Survey and Outlook from Image Analysis and Machine Learning Perspectives29Multiobjective optimization for target design in diffraction-based overlay metrology11Recent Progresses in Nanometer Scale Analysis of Buried Layers and Interfaces in Thin Films by X-rays and Neutrons10Accurate tip characterization in critical dimension atomic force microscopy35Line edge roughness measurement on vertical sidewall for reference metrology using a metrological tilting atomic force microscope12Neural network evaluation of geometric tip-sample effects in AFM measurements14Machine learning techniques applied for the detection of nanoparticles on surfaces using coherent Fourier scatterometry24Reconfigurable logic and neuromorphic circuits based on electrically tunable two-dimensional homojunctions386Nanoscale imaging of mobile carriers and trapped charges in delta doped silicon p–n junctions37Picometer wavefront sensing using the phase-contrast technique28Uncertainty Estimation and Design Optimization of 2D Diffraction-Based Overlay Metrology Targets12Grazing incidence-x-ray fluorescence for a dimensional and compositional characterization of well-ordered 2D and 3D nanostructures21Ultrascaled Double-Gate Monolayer Sn S 2 MOSFETs for High-Performance and Low-Power Applications54An insight into optical metrology in manufacturing89Model sensitivity analysis of Monte-Carlo based SEM simulations14Diffraction-based overlay metrology using angular-multiplexed acquisition of dark-field digital holograms28Current challenges and potential directions towards precision microscale additive manufacturing – Part IV: Future perspectives52Non-destructive thickness characterisation of 3D multilayer semiconductor devices using optical spectral measurements and machine learning33Laser Interference Lithography for Fabrication of Planar Scale Gratings for Optical Metrology93Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometry137Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica22Self-calibration of a variable-line-spacing grating for an absolute optical encoder with a Fizeau interferometer11Quantum Transport in Monolayer α‐CS Field‐Effect Transistors13Inverse problem of Mueller polarimetry for metrological applications9Direct Imaging of Integrated Circuits in CPU with 60 nm Super-Resolution Optical Microscope14A new type of nanoscale reference grating manufactured by combined laser-focused atomic deposition and x-ray interference lithography and its use for calibrating a scanning electron microscope23Optimization of quantum-dot qubit fabrication via machine learning12Experimental evaluation of uncertainty in sub-nanometer metrology using transmission electron microscopy due to magnification variation9Analytic Design of Segmented Phase Grating for Optical Sensing in High-Precision Alignment System10Review of THz-based semiconductor assurance53New European Metrology Network for advanced manufacturing15Shape- and Element-Sensitive Reconstruction of Periodic Nanostructures with Grazing Incidence X-ray Fluorescence Analysis and Machine Learning26Hardware Trust and Assurance through Reverse Engineering: A Tutorial and Outlook from Image Analysis and Machine Learning Perspectives90Uncertainties in the reconstruction of nanostructures in EUV scatterometry and grazing incidence small-angle X-ray scattering19Neural network assisted multi-parameter global sensitivity analysis for nanostructure scatterometry21Optical method for simultaneous thickness measurements of two layers with a significant thickness difference32Reconstruction of finite deep sub-wavelength nanostructures by Mueller-matrix scattered-field microscopy11Promising Properties of a Sub-5-nm Monolayer MoSi2N4 Transistor84Simultaneous Dimensional and Analytical Characterization of Ordered Nanostructures21Invariance Property of the Fisher Information in Scattering Media10Optimal Control of Coherent Light Scattering for Binary Decision Problems15Optimal Control of Coherent Light Scattering for Binary Decision Problems11Investigation of correlative parameters to evaluate EUV lithographic performance of PMMA18Transistors and logic circuits enabled by 2D transition metal dichalcogenides: a state-of-the-art survey28Building Supramolecular Chirality in Bulk Heterojunctions Enables Amplified Dissymmetry Current for High-Performing Circularly Polarized Light Detection54Auger Electron Spectroscopy (AES) and X-ray Photoelectron Spectroscopy (XPS) Profiling of Self Assembled Monolayer (SAM) Patterns Based on Vapor Deposition Technique9Machine learning aided solution to the inverse problem in optical scatterometry41Comparison of EUV Photomask Metrology Between CD-AFM and TEM18Microsphere-assisted, nanospot, non-destructive metrology for semiconductor devices67Electrically Reconfigurable Organic Logic Gates: A Promising Perspective on a Dual‐Gate Antiambipolar Transistor49Plasma atomic layer etching for titanium nitride at low temperatures17Bio‐Inspired 3D Artificial Neuromorphic Circuits83Analysis of Line-Edge Roughness Using EUV Scatterometry16Si-Doped HfO2-Based Ferroelectric Tunnel Junctions with a Composite Energy Barrier for Non-Volatile Memory Applications28Superachromatic polarization modulator for stable and complete polarization measurement over an ultra-wide spectral range10Optical wafer defect inspection at the 10 nm technology node and beyond159Toward realization of high-throughput hyperspectral imaging technique for semiconductor device metrology20Optical spectrum augmentation for machine learning powered spectroscopic ellipsometry17Emergent ferroelectricity in subnanometer binary oxide films on silicon201Shape and Roughness Extraction of Line Gratings by Small Angle X-Ray Scattering: Statistics and Simulations13Electrostatically Controllable Channel Thickness and Tunable Low-Frequency Noise Characteristics of Double-Gated Multilayer MoS2 Field-Effect Transistors with h-BN Dielectric11Mueller matrix spectroscopic ellipsometry68Mapping of the mechanical response in Si/SiGe nanosheet device geometries17Emerging Optoelectronic Devices Based on Microscale LEDs and Their Use as Implantable Biomedical Applications17Chiral Non‐Fullerene Acceptor Enriched Bulk Heterojunctions Enable High‐Performance Near‐Infrared Circularly Polarized Light Detection36Bayesian Target‐Vector Optimization for Efficient Parameter Reconstruction9Ferroelectrics-Integrated Two-Dimensional Devices toward Next-Generation Electronics147Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies48Smart optical coordinate and surface metrology19Nonlinear polarization imaging by parametric upconversion21Effect of sidewall roughness on the diffraction efficiency of EUV high aspect ratio freestanding transmission gratings12Ultrasensitive and long-range transverse displacement metrology with polarization-encoded metasurface59The electronic structure and interfacial contact with metallic borophene of monolayer ScSX (X = I, Br, and Cl)14Efficient Rigorous Coupled-Wave Analysis Simulation of Mueller Matrix Ellipsometry of Three-Dimensional Multilayer Nanostructures11Universal logic-in-memory cell enabling all basic Boolean algebra logic113D microscopy in industrial measurements9Self-Calibration of a Large-Scale Variable-Line-Spacing Grating for an Absolute Optical Encoder by Differencing Spatially Shifted Phase Maps from a Fizeau Interferometer14Super-Resolution Fluorescence Imaging for Semiconductor Nanoscale Metrology and Inspection25A combination of library search and Levenberg-Marquardt algorithm in optical scatterometry16Integrated optical critical dimension metrology with Mueller matrix ellipsometry12Mapping spectroscopic micro-ellipsometry with sub-5 microns lateral resolution and simultaneous broadband acquisition at multiple angles20Biofuel Cells and Biobatteries: Misconceptions, Opportunities, and Challenges47Massively parallel electro-optic sampling of space-encoded optical pulses for ultrafast multi-dimensional imaging24Sub-resolution contrast in neutral helium microscopy through facet scattering for quantitative imaging of nanoscale topographies on macroscopic surfaces12Sub-50 nm optical imaging in ambient air with 10× objective lens enabled by hyper-hemi-microsphere43Fourier ptychographic topography33Semiconductor Multilayer Nanometrology with Machine Learning34Emerging Mueller matrix microscopy applications in biophysics and biomedicine10Realizing In-Memory Baseband Processing for Ultrafast and Energy-Efficient 6G31Ultra‐Large Scale Stitchless AFM: Advancing Nanoscale Characterization and Manipulation with Zero Stitching Error and High Throughput77Ferroelectric gating of two-dimensional semiconductors for the integration of steep-slope logic and neuromorphic devices132Optical Far-Field Detection of Sub-λ/14 Wide Defects by Conjugate Structured Light-Field Microscopy (c-SIM)14High-precision surface profilometry on a micron-groove based on dual-comb electronically controlled optical sampling16X-ray-based overlay metrology using reciprocal space slicing analysis11Tabletop extreme ultraviolet reflectometer for quantitative nanoscale reflectometry, scatterometry, and imaging25Atomic and Close-to-Atomic Scale Manufacturing: The Fundamental Technology of Manufacturing III17Integrated metrology for advanced manufacturing83A review of novel methods to improve the optical and electrical properties of n-type and p-type sulphides and oxides: leading the frontiers of semiconductor technology32Generic characterization method for nano‐gratings using deep‐neural‐network‐assisted ellipsometry15Triple Synergism Effect of Ammonium Nitrilotriacetate on the Chemical Mechanical Polishing Performance of Ruthenium Barrier Layers15Precise Surface Profiling at the Nanoscale Enabled by Deep Learning20Virtual metrology in semiconductor manufacturing: Current status and future prospects70Can 2D Semiconductors Be Game-Changers for Nanoelectronics and Photonics?48A three-terminal light emitting and detecting diode147Period measurement of a periodic structure by using a heterodyne grating interferometer10Lens-free reflective topography for high-resolution wafer inspection17CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology119Inverse optical scatterometry using sketch-guided deep learning12Channeled spectroscopic ellipsometry enabled by physics-informed tandem untrained neural networks15Microsphere-assisted hyperspectral imaging: super-resolution, non-destructive metrology for semiconductor devices25Solution‐Processed Ultralow Voltage Organic Transistors With Sharp Switching for Adaptive Visual Perception53One-shot TSOM with a multi-task learning model for simultaneous dimension measurement and defect inspection11Advancements in metrology for advanced semiconductor packaging10Large-range displacement measurement in narrow space scenarios: fiber microprobe sensor with subnanometer accuracy74A Review of Thin-film Thickness Measurements using Optical Methods42Conformal Antireflective Multilayers for High‐Numerical‐Aperture Deep‐Ultraviolet Lenses14Shortened and simplified traceability chain for dimensional metrology based on self-traceable standards21Wavelength-multiplexed multi-mode EUV reflection ptychography based on automatic differentiation48Linear symmetric self-selecting 14-bit kinetic molecular memristors76Super-resolution acoustic displacement metrology through topological pairs in orbital meta-atoms153D alignment of distant patterns with deep-subwavelength precision using metasurfaces16Quasi-visualizable detection of deep sub-wavelength defects in patterned wafers by breaking the optical form birefringence18Van der Waals semiconductor InSe plastifies by martensitic transformation21Piezoelectric phononic integrated circuits112D amorphous solids for sub-nanometer scale devices10Nanometer Interlaced Displacement Metrology Using Diffractive Pancharatnam-Berry and Detour Phase Metasurfaces1112-Spin-Qubit Arrays Fabricated on a 300 mm Semiconductor Manufacturing Line61Quantum magnetometry of transient signals with a time resolution of 1.1 nanoseconds14Nanophotonic inspection of deep-subwavelength integrated optoelectronic chips10Metrology of metasurfaces: optical properties22Coherent nanoscale imaging and chemical mapping with compact extreme ultraviolet and soft x-ray sources: Review and perspective18Natural van der Waals Canalization Lens for Non‐Destructive Nanoelectronic Circuit Imaging and Inspection20Artificial Intelligence‐Driven Approaches in Semiconductor Research44AI-Powered Next-Generation Technology for Semiconductor Optical Metrology: A Review10Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology15

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