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RESEARCH PAPER · Surface Science · 2018

Platinum atomic layer deposition on metal substrates: A surface chemistry study

Clinton Lien, Huaxing Sun, Xiangdong Qin, Francisco Zaera

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21 direct citing papers in this saved network. Explore the next layer with second-order citations.

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Platinum atomic layer deposition on metal substrates: A surface chemistry studyOriginalGas-Phase Electron-Impact Activation of Atomic Layer Deposition (ALD) Precursors: MeCpPtMe313Application of time-of-flight secondary ion mass spectrometry to the detection of surface intermediates during the first cycle of atomic layer deposition (ALD) of platinum on silica surfaces7Thermal Chemistry of Metal Organic Compounds Adsorbed on Oxide Surfaces17ToF-SIMS Investigation of the Initial Stages of MeCpPt(CH3)3 Adsorption and Decomposition on Nickel Oxide Surfaces: Exploring the Role and Location of the Ligands6Formation of silica-supported platinum nanoparticles as a function of preparation conditions and boron impregnation5Density Functional Theory Study of the Adsorption and Dissociation of Copper(I) Acetamidinates on Ni(110): The Effect of the Substrate6An enhanced activity of Pt/CeO2/CNT triple junction interface catalyst prepared by atomic layer deposition for oxygen reduction reaction32Thermal Chemistry of Nickel Diketonate Atomic Layer Deposition (ALD) Precursors on Tantalum and Silicon Oxide Surfaces9Coordination and organometallic precursors of group 10 and 11: Focused electron beam induced deposition of metals and insight gained from chemical vapour deposition, atomic layer deposition, and fundamental surface and gas phase studies82Atomic Layer Deposition of Ruthenium Films Using Ruthenium Diketonates and O2, H2, or N2O: The Role of Ruthenium Etching4Modern Solutions for Functional Coatings in CVD Processes10Conformal Three-Dimensional Platinum Coating Using Rotary-Type Atomic Layer Deposition for a Diesel Oxidation Catalyst Application5Trimethylplatinum(IV) Complexes for MOCVD Applications: A Physicochemical Study0Trimethylplatinum(IV) Complexes for MOCVD Applications: A Physicochemical Study0In vacuo studies on reaction mechanisms in ALD processes of ruthenium and platinum films14Role of the Oxidizing Co-Reactant in Pt Growth by Atomic Layer Deposition Using MeCpPtMe3 and O2/O3/O2-Plasma8The surface chemistry of the atomic layer deposition of metal thin films7Gas- versus Liquid-Phase Silylation as a Way to Inhibit Thin-Film Atomic Layer Deposition (ALD) on Silicon Oxide Substrates2In Vacuo Studies on the Mechanism of Inherently Area-Selective Atomic Layer Deposition of Iridium1Electrocatalysts obtained by atomic layer deposition technology for PEM fuel cells and electrolysers3Inducing chemical selectivity in the atomic layer deposition (ALD) of oxide films via gas-phase silylation using N-(trimethylsilyl)dimethylamine (TMSDMA)0

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21 direct citing papers saved.

  1. Gas-Phase Electron-Impact Activation of Atomic Layer Deposition (ALD) Precursors: MeCpPtMe3

    The Journal of Physical Chemistry Letters · 2018-08-01

    Clinton Lien, Mahsa Konh, Bo Chen, Andrew V. Teplyakov, Francisco Zaera

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  2. Application of time-of-flight secondary ion mass spectrometry to the detection of surface intermediates during the first cycle of atomic layer deposition (ALD) of platinum on silica surfaces

    Applied Surface Science · 2019-05-19

    Mahsa Konh, Clinton Lien, Francisco Zaera, Andrew V. Teplyakov

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  3. Thermal Chemistry of Metal Organic Compounds Adsorbed on Oxide Surfaces

    Organometallics · 2019-11-25

    Bo Chen, Xiangdong Qin, Clinton Lien, Menno Bouman, Mahsa Konh, Yichen Duan, Andrew V. Teplyakov, Francisco Zaera

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  4. ToF-SIMS Investigation of the Initial Stages of MeCpPt(CH3)3 Adsorption and Decomposition on Nickel Oxide Surfaces: Exploring the Role and Location of the Ligands

    Organometallics · 2020-02-03

    Mahsa Konh, Clinton Lien, Xuefen Cai, Su‐Huai Wei, Anderson Janotti, Francisco Zaera, Andrew V. Teplyakov

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  5. Formation of silica-supported platinum nanoparticles as a function of preparation conditions and boron impregnation

    The Journal of Chemical Physics · 2020-04-01

    Sana Rani, Carly Byron, Andrew V. Teplyakov

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  6. Density Functional Theory Study of the Adsorption and Dissociation of Copper(I) Acetamidinates on Ni(110): The Effect of the Substrate

    The Journal of Physical Chemistry C · 2020-07-01

    Noboru Takeuchi, Emiliano Ventura‐Macías, J. Guerrero-Sánchez, Francisco Zaera

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  7. An enhanced activity of Pt/CeO2/CNT triple junction interface catalyst prepared by atomic layer deposition for oxygen reduction reaction

    Chemical Physics Letters · 2020-07-15

    Jinwei Chen, Zhenjie Li, Yihan Chen, Jie Zhang, Yan Luo, Gang Wang, Ruilin Wang

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  8. Thermal Chemistry of Nickel Diketonate Atomic Layer Deposition (ALD) Precursors on Tantalum and Silicon Oxide Surfaces

    The Journal of Physical Chemistry C · 2021-10-04

    Md. Abdul Motin, Francisco Zaera

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  9. Coordination and organometallic precursors of group 10 and 11: Focused electron beam induced deposition of metals and insight gained from chemical vapour deposition, atomic layer deposition, and fundamental surface and gas phase studies

    Coordination Chemistry Reviews · 2022-01-05

    Ivo Utke, Petra Swiderek, Katja Höflich, Katarzyna Madajska, Jakub Jurczyk, Petra Martinović, Iwona Barbara Szymańska

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  10. Atomic Layer Deposition of Ruthenium Films Using Ruthenium Diketonates and O2, H2, or N2O: The Role of Ruthenium Etching

    The Journal of Physical Chemistry C · 2022-07-22

    Xiangdong Qin, Francisco Zaera

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  11. Modern Solutions for Functional Coatings in CVD Processes

    Coatings · 2022-08-30

    Igor K. Igumenov, V. V. Lukashov

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  12. Conformal Three-Dimensional Platinum Coating Using Rotary-Type Atomic Layer Deposition for a Diesel Oxidation Catalyst Application

    International Journal of Precision Engineering and Manufacturing-Green Technology · 2022-11-21

    Sungho Yoon, Min Jong Kil, Jun-Hyeok Jeon, Hyun-Mi Kim, Seul‐Gi Kim, Seul-Gi Kim, Jiye Han, Eui-Sung Lee, Young-Mo An, Jin Woo Cho, Jihwan An, Jae‐Boong Choi, Il Jeon, Hyeongkeun Kim, Hyeongkeun Kim

    Read original paper ↗ ·

  13. Trimethylplatinum(IV) Complexes for MOCVD Applications: A Physicochemical Study

    Russian Journal of Coordination Chemistry · 2023-08-01

    S. I. Dorovskikh, Natalia V. Kuratieva, Ilya V. Korolkov, Tamara V. Basova, Igor Yu. Ilyin

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  14. Trimethylplatinum(IV) Complexes for MOCVD Applications: A Physicochemical Study

    Координационная химия · 2023-08-01

    S. I. Dorovskikh, Natalia V. Kuratieva, Ilya V. Korolkov, Tamara V. Basova, Igor Yu. Ilyin

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  15. In vacuo studies on reaction mechanisms in ALD processes of ruthenium and platinum films

    Applied Surface Science · 2023-11-29

    Heta-Elisa Nieminen, Matti I. Putkonen, Mikko Ritala

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  16. Role of the Oxidizing Co-Reactant in Pt Growth by Atomic Layer Deposition Using MeCpPtMe3 and O2/O3/O2-Plasma

    The Journal of Physical Chemistry C · 2024-01-31

    Jin Chun Li, Sylwia Klejna, Matthias M. Minjauw, Jolien Dendooven, Christophe Detavernier

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  17. The surface chemistry of the atomic layer deposition of metal thin films

    Nanotechnology · 2024-06-18

    Francisco Zaera

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  18. Gas- versus Liquid-Phase Silylation as a Way to Inhibit Thin-Film Atomic Layer Deposition (ALD) on Silicon Oxide Substrates

    The Journal of Physical Chemistry C · 2025-05-07

    M. Shah Alam, Md. Abdul Motin, Francisco Zaera

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  19. In Vacuo Studies on the Mechanism of Inherently Area-Selective Atomic Layer Deposition of Iridium

    Chemistry of Materials · 2025-08-31

    Heta-Elisa Nieminen, Matti I. Putkonen, Mikko Ritala

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  20. Electrocatalysts obtained by atomic layer deposition technology for PEM fuel cells and electrolysers

    International Journal of Hydrogen Energy · 2026-05-05

    Silvia-Iustina Pintilie, Claudia Cobzaru, Mihaela Iordache, Adriana Marinoiu

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  21. Inducing chemical selectivity in the atomic layer deposition (ALD) of oxide films via gas-phase silylation using N-(trimethylsilyl)dimethylamine (TMSDMA)

    Applied Surface Science · 2026-06-18

    Mohammed Sadman Alam, Francisco Zaera

    Read original paper ↗ ·
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