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RESEARCH PAPER · The Journal of Physical Chemistry C · 2020

Density Functional Theory Study of the Adsorption and Dissociation of Copper(I) Acetamidinates on Ni(110): The Effect of the Substrate

Noboru Takeuchi, Emiliano Ventura‐Macías, J. Guerrero-Sánchez, Francisco Zaera

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6 direct citing papers in this saved network. Explore the next layer with second-order citations.

Open in your workspace →Saved 2026-10-12 · complete coverage
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Density Functional Theory Study of the Adsorption and Dissociation of Copper(I) Acetamidinates on Ni(110): The Effect of the SubstrateOriginalThe Early Steps of Molecule-to-Material Conversion in Chemical Vapor Deposition (CVD): A Case Study20Thermal Chemistry of Nickel Diketonate Atomic Layer Deposition (ALD) Precursors on Tantalum and Silicon Oxide Surfaces9Super-conformal TiN thin film deposition by carrier pulse purge atomic layer deposition system: Chamber design optimization with computational fluid dynamics3On the Mechanism of the Atomic Layer Deposition of Cu Films on Silicon Oxide Surfaces: Activation Using Atomic Hydrogen and Three-Dimensional Growth9Towards understanding the first half-ALD cycle of Ag growth: adsorption and dissociation of silver( i ) acetamidinates on the Ag(110) surface1The surface chemistry of the atomic layer deposition of metal thin films7

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6 direct citing papers saved.

  1. The Early Steps of Molecule-to-Material Conversion in Chemical Vapor Deposition (CVD): A Case Study

    Molecules · 2021-04-01

    Davide Barreca, Ettore Fois, Alberto Gasparotto, Chiara Maccato, Mario Oriani, Gloria Tabacchi

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  2. Thermal Chemistry of Nickel Diketonate Atomic Layer Deposition (ALD) Precursors on Tantalum and Silicon Oxide Surfaces

    The Journal of Physical Chemistry C · 2021-10-04

    Md. Abdul Motin, Francisco Zaera

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  3. Super-conformal TiN thin film deposition by carrier pulse purge atomic layer deposition system: Chamber design optimization with computational fluid dynamics

    Thin Solid Films · 2023-02-24

    Jin-Ho Jeon, Heungsoo Park, Dong Chan Suh, Dae‐Hong Ko

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  4. On the Mechanism of the Atomic Layer Deposition of Cu Films on Silicon Oxide Surfaces: Activation Using Atomic Hydrogen and Three-Dimensional Growth

    Chemistry of Materials · 2023-03-03

    Yunxi Yao, Bo Chen, Francisco Zaera

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  5. Towards understanding the first half-ALD cycle of Ag growth: adsorption and dissociation of silver( i ) acetamidinates on the Ag(110) surface

    Physical Chemistry Chemical Physics · 2024-01-01

    J. I. Páez-Ornelas, Noboru Takeuchi, J. Guerrero-Sánchez

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  6. The surface chemistry of the atomic layer deposition of metal thin films

    Nanotechnology · 2024-06-18

    Francisco Zaera

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