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RESEARCH PAPER · Organometallics · 2019

Thermal Chemistry of Metal Organic Compounds Adsorbed on Oxide Surfaces

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Thermal Chemistry of Metal Organic Compounds Adsorbed on Oxide SurfacesOriginalDensity Functional Theory Study of the Adsorption and Dissociation of Copper(I) Acetamidinates on Ni(110): The Effect of the Substrate6Tuning Ligand‐Coordinated Single Metal Atoms on TiO2 and their Dynamic Response during Hydrogenation Catalysis25Atomic Layer Modulation of Multicomponent Thin Films through Combination of Experimental and Theoretical Approaches21Thermal Chemistry of Nickel Diketonate Atomic Layer Deposition (ALD) Precursors on Tantalum and Silicon Oxide Surfaces9Cyclic and Non-Cyclic Pi Complexes of Manganese0Adsorption, thermal conversion, and catalytic hydrogenation of acrolein on Cu surfaces11Role of Cyclopentadienyl Ligands of Group 4 Precursors toward High-Temperature Atomic Layer Deposition28Atomic Layer Deposition of HfS2 on Oxide Interfaces: A Model Study on the Initial Nucleation Processes4On the Mechanism of the Atomic Layer Deposition of Cu Films on Silicon Oxide Surfaces: Activation Using Atomic Hydrogen and Three-Dimensional Growth9Atomic Layer Deposition of HfS 2 on Functionalized Self-Assembled Monolayers on Ordered Oxide Surfaces: A Model Study under UHV Conditions7Different Nucleation Mechanisms during Atomic Layer Deposition of HfS 2 on Cobalt Oxide Surfaces3The surface chemistry of the atomic layer deposition of metal thin films7The surface chemistry of the atomic layer deposition of ruthenium on aluminum and tantalum oxide surfaces1Bridge‐Oxygen Bond: An Active Group for Energy Electrocatalysis17Vapor Phase Installation of CpCo(CO) 2 in MOF‐8080Rational design of a multifunctional bimetallic ZIFs-V2C MXene nanohybrid for enhanced mechanical durability and EMI shielding in polymeric coatings8Atomic proximity in dual-atom catalysts: A favorable factor towards 4e− oxygen reduction reaction: A critical review1

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  1. Density Functional Theory Study of the Adsorption and Dissociation of Copper(I) Acetamidinates on Ni(110): The Effect of the Substrate

    The Journal of Physical Chemistry C · 2020-07-01

    Noboru Takeuchi, Emiliano Ventura‐Macías, J. Guerrero-Sánchez, Francisco Zaera

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  2. Tuning Ligand‐Coordinated Single Metal Atoms on TiO2 and their Dynamic Response during Hydrogenation Catalysis

    ChemSusChem · 2021-05-06

    Xuemei Zhou, George E. Sterbinsky, Eman Wasim, Linxiao Chen, Steven L. Tait

    Read original paper ↗ ·
  3. Atomic Layer Modulation of Multicomponent Thin Films through Combination of Experimental and Theoretical Approaches

    Chemistry of Materials · 2021-06-10

    Chi Thang Nguyen, Bonwook Gu, Taehoon Cheon, Jeongwoo Park, Mohammad Rizwan Khan, Soo‐Hyun Kim, Bonggeun Shong, Han‐Bo‐Ram Lee

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  4. Thermal Chemistry of Nickel Diketonate Atomic Layer Deposition (ALD) Precursors on Tantalum and Silicon Oxide Surfaces

    The Journal of Physical Chemistry C · 2021-10-04

    Md. Abdul Motin, Francisco Zaera

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  5. Cyclic and Non-Cyclic Pi Complexes of Manganese

    Elsevier eBooks · 2021-12-30

    Jeffrey S. Price, David J. H. Emslie

    Read original paper ↗ ·
  6. Adsorption, thermal conversion, and catalytic hydrogenation of acrolein on Cu surfaces

    Journal of Catalysis · 2022-09-20

    Mindika Tilan Nayakasinghe, Rodrigo Ponce-Pérez, Bo Chen, Noboru Takeuchi, Francisco Zaera

    Read original paper ↗ ·
  7. Role of Cyclopentadienyl Ligands of Group 4 Precursors toward High-Temperature Atomic Layer Deposition

    The Journal of Physical Chemistry C · 2022-10-13

    Tran Thi Ngoc Van, Donghak Jang, Eunae Jung, Hyunsik Noh, Jiwon Moon, Deok-Sin Kil, Sung-Woong Chung, Bonggeun Shong

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  8. Atomic Layer Deposition of HfS2 on Oxide Interfaces: A Model Study on the Initial Nucleation Processes

    The Journal of Physical Chemistry C · 2022-12-14

    Georg Fickenscher, Lukas Fromm, Andreas Görling, Jörg Libuda

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  9. On the Mechanism of the Atomic Layer Deposition of Cu Films on Silicon Oxide Surfaces: Activation Using Atomic Hydrogen and Three-Dimensional Growth

    Chemistry of Materials · 2023-03-03

    Yunxi Yao, Bo Chen, Francisco Zaera

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  10. Atomic Layer Deposition of HfS 2 on Functionalized Self-Assembled Monolayers on Ordered Oxide Surfaces: A Model Study under UHV Conditions

    The Journal of Physical Chemistry C · 2024-01-04

    Georg Fickenscher, Julien Steffen, Andreas Görling, Jörg Libuda

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  11. Different Nucleation Mechanisms during Atomic Layer Deposition of HfS 2 on Cobalt Oxide Surfaces

    Advanced Materials Interfaces · 2024-06-14

    Georg Fickenscher, Nikolai Sidorenko, Kira Mikulinskaya, Jörg Libuda

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  12. The surface chemistry of the atomic layer deposition of metal thin films

    Nanotechnology · 2024-06-18

    Francisco Zaera

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  13. The surface chemistry of the atomic layer deposition of ruthenium on aluminum and tantalum oxide surfaces

    Surface Science · 2024-08-10

    Xiangdong Qin, Francisco Zaera

    Read original paper ↗ ·
  14. Bridge‐Oxygen Bond: An Active Group for Energy Electrocatalysis

    Advanced Functional Materials · 2025-03-20

    Nana Zhang, Zilan Zhang, Siwei Yan, Rui Zhang, Pengfei Yin, Xi‐Wen Du, Hui Liu

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  15. Vapor Phase Installation of CpCo(CO) 2 in MOF‐808

    Advanced Materials Interfaces · 2025-07-01

    Thabiso Kunene, Juan P. Vizuet, Matthew J. Klenk, Peter Zapol, Ksenija D. Glusac, Alex B. F. Martinson

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  16. Rational design of a multifunctional bimetallic ZIFs-V2C MXene nanohybrid for enhanced mechanical durability and EMI shielding in polymeric coatings

    Journal of the Taiwan Institute of Chemical Engineers · 2026-02-03

    Reza Ghamarpoor, Bahram Ramezanzadeh

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  17. Atomic proximity in dual-atom catalysts: A favorable factor towards 4e− oxygen reduction reaction: A critical review

    Inorganic Chemistry Communications · 2026-05-10

    Anuj Kumar, Toshkulov A. Kh, Kholnazarov Bakhodir Azamovich, Kottakkaran Sooppy Nisar, Akil Ahmad, Iram Malik

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