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RESEARCH PAPER · Chemistry of Materials · 2019

Structure–Charge Transport Relationships in Fluoride-Doped Amorphous Semiconducting Indium Oxide: Combined Experimental and Theoretical Analysis

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42 direct citing works

Structure–Charge Transport Relationships in Fluoride-Doped Amorphous Semiconducting Indium Oxide: Combined Experimental and Theoretical AnalysisOriginalResilience of Fluorinated Indium-Gallium-Zinc Oxide Thin-Film Transistor Against Hydrogen-Induced Degradation30Thiazolothiazole‐Based Quinoidal Compounds for High‐Performance n‐Channel Organic Field‐Effect Transistors with Low‐Cost Metal Electrodes7Fluorinated indium‐gallium‐zinc oxide thin‐film transistor with reduced vulnerability to hydrogen‐induced degradation14Frequency-Agile Low-Temperature Solution-Processed Alumina Dielectrics for Inorganic and Organic Electronics Enhanced by Fluoride Doping37Monolithic Integration of Fluorinated Metal-Oxide Thin-Film Transistor and Hydrogenated Amorphous Silicon Photo-Diode0Analysis of low frequency noise in in situ fluorine-doped ZnSnO thin-film transistors3Aqueous solution-deposited aluminum-gallium-oxide alloy gate dielectrics for low voltage fully oxide thin film transistors12Deterministic role of fluorine incorporation in the amorphous Zn–O–N semiconductors: First-principles and experimental studies5Combustion Synthesis and Polymer Doping of Metal Oxides for High-Performance Electronic Circuitry15Role of Fluoride Doping in Low-Temperature Combustion-Synthesized ZrOx Dielectric Films15Nonvolatile High-Speed Switching Zn-O-N Thin-Film Transistors with a Bilayer Structure17Fluoride Doping in Crystalline and Amorphous Indium Oxide Semiconductors12Elevated‐Metal Metal‐Oxide Thin‐Film Transistors: A Back‐Gate Transistor Architecture with Annealing‐Induced Source/Drain Regions1Low‐Temperature Thin‐Film Combustion Synthesis of Metal‐Oxide Semiconductors: Science and Technology2In-situ fluorine-doped ZnSnO thin film and thin-film transistor7Transparent and flexible zinc oxide-based thin-film diodes and thin-film transistors: A review29Atomic layer deposition of oxide semiconductor thin films for transistor applications: a review32Remarkable Bias‐Stress Stability of Ultrathin Atomic‐Layer‐Deposited Indium Oxide Thin‐Film Transistors Enabled by Plasma Fluorination28Optimized hydrogen-supplying gate insulator for high-mobility indium oxide TFTs via atomic-level oxygen reactant engineering8Simultaneously enhanced mobility and stability in In2O3 thin-film transistor by nitrogen modification6Decoupling Reversible Interface Trapping and Irreversible Bulk Transitions in Solution-Processed Indium Zinc Oxide Thin-Film Transistors1Next-generation materials and devices by combustion processes0

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  1. Resilience of Fluorinated Indium-Gallium-Zinc Oxide Thin-Film Transistor Against Hydrogen-Induced Degradation

    IEEE Electron Device Letters · 2020-03-27

    Sisi Wang, Runxiao Shi, Jiapeng Li, Lei Lü, Zhihe Xia, Hoi Sing Kwok, Man Wong

    Read original paper ↗ ·
  2. Thiazolothiazole‐Based Quinoidal Compounds for High‐Performance n‐Channel Organic Field‐Effect Transistors with Low‐Cost Metal Electrodes

    Advanced Electronic Materials · 2020-05-17

    Feng Yun Yan, Xiaolan Qiao, Guangcheng Ouyang, Guohua Liu, Hongxiang Li

    Read original paper ↗ ·
  3. Fluorinated indium‐gallium‐zinc oxide thin‐film transistor with reduced vulnerability to hydrogen‐induced degradation

    Journal of the Society for Information Display · 2020-06-01

    Sisi Wang, Jiapeng Li, Runxiao Shi, Zhihe Xia, Lei Lü, Hoi Sing Kwok, Man Wong

    Read original paper ↗ ·
  4. Frequency-Agile Low-Temperature Solution-Processed Alumina Dielectrics for Inorganic and Organic Electronics Enhanced by Fluoride Doping

    Journal of the American Chemical Society · 2020-06-15

    Xinming Zhuang, Sawankumar V. Patel, Chi Zhang, Binghao Wang, Yao Chen, Haoyu Liu, Vinayak P. Dravid, Junsheng Yu, Yan‐Yan Hu, Wei Huang, Antonio F. Facchetti, Tobin Jay Marks

    Read original paper ↗ ·
  5. Monolithic Integration of Fluorinated Metal-Oxide Thin-Film Transistor and Hydrogenated Amorphous Silicon Photo-Diode

    IEEE International Conference on Solid-State & Integrated Circuit Technology (ICSICT) · 2020-11-03

    Man Wong, Sisi Wang, Zhichao Zhou

    Read original paper ↗ ·
  6. Analysis of low frequency noise in in situ fluorine-doped ZnSnO thin-film transistors

    AIP Advances · 2021-04-01

    Xuemei Yin, Yayi Chen, Guoyuan Li, Wei Zhong, Sunbin Deng, Lei Lü, Guijun Li, Hoi Sing Kwok, Rongsheng Chen

    Read original paper ↗ ·
  7. Aqueous solution-deposited aluminum-gallium-oxide alloy gate dielectrics for low voltage fully oxide thin film transistors

    Applied Physics Letters · 2021-09-13

    Fuchao He, Yifei Wang, Zhenhua Lin, Jie Su, Jincheng Zhang, Jingjing Chang, Yue Hao

    Read original paper ↗ ·
  8. Deterministic role of fluorine incorporation in the amorphous Zn–O–N semiconductors: First-principles and experimental studies

    AIP Advances · 2021-10-01

    Hyoung-Do Kim, Hyoung-Do Kim, Jong Heon Kim, Seong Cheol Jang, Ho‐Hyun Nahm, Hyun‐Suk Kim, Hyun‐Suk Kim

    Read original paper ↗ ·
  9. Combustion Synthesis and Polymer Doping of Metal Oxides for High-Performance Electronic Circuitry

    Accounts of Chemical Research · 2022-01-19

    Binghao Wang, Wei Huang, Michael J. Bedzyk, Vinayak P. Dravid, Yan‐Yan Hu, Tobin Jay Marks, Antonio F. Facchetti

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  10. Role of Fluoride Doping in Low-Temperature Combustion-Synthesized ZrOx Dielectric Films

    ACS Applied Materials & Interfaces · 2022-03-02

    Aritra Sil, Elise A. Goldfine, Wei Huang, Michael J. Bedzyk, Julia E. Medvedeva, Antonio F. Facchetti, Tobin Jay Marks

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  11. Nonvolatile High-Speed Switching Zn-O-N Thin-Film Transistors with a Bilayer Structure

    ACS Applied Materials & Interfaces · 2022-03-08

    Hyoung-Do Kim, Hyoung-Do Kim, Muhammad Naqi, Seong Cheol Jang, Jimin Park, Yun Chang Park, Kyung Park, Ho‐Hyun Nahm, Sunkook Kim, Hyun-Suk Kim, Hyun-Suk Kim

    Read original paper ↗ ·
  12. Fluoride Doping in Crystalline and Amorphous Indium Oxide Semiconductors

    Chemistry of Materials · 2022-03-24

    Aritra Sil, Michael J. Deck, Elise A. Goldfine, Chi Zhang, Sawankumar V. Patel, Steven Flynn, Haoyu Liu, Po‐Hsiu Chien, Kenneth Reinhard Poeppelmeier, Vinayak P. Dravid, Michael J. Bedzyk, Julia E. Medvedeva, Yan‐Yan Hu, Antonio F. Facchetti, Tobin Jay Marks

    Read original paper ↗ ·
  13. Elevated‐Metal Metal‐Oxide Thin‐Film Transistors: A Back‐Gate Transistor Architecture with Annealing‐Induced Source/Drain Regions

    Unknown journal · 2022-05-20

    Man Wong, Zhihe Xia, Jiapeng Li

    Read original paper ↗ ·
  14. Low‐Temperature Thin‐Film Combustion Synthesis of Metal‐Oxide Semiconductors: Science and Technology

    Unknown journal · 2022-05-20

    Binghao Wang, Wei Huang, Antonio F. Facchetti, Tobin Jay Marks

    Read original paper ↗ ·
  15. In-situ fluorine-doped ZnSnO thin film and thin-film transistor

    Solid-State Electronics · 2023-08-11

    Xuemei Yin, Delang Lin, Wei Zhong, Yayi Chen, Guijun Li, Yi Li, Rongsheng Chen

    Read original paper ↗ ·
  16. Transparent and flexible zinc oxide-based thin-film diodes and thin-film transistors: A review

    Journal of Applied Physics · 2023-11-17

    Krutika Natu, Meena Sadashiv Laad, Babaji Ghule, Akhila Shalu

    Read original paper ↗ ·
  17. Atomic layer deposition of oxide semiconductor thin films for transistor applications: a review

    Journal of Materials Chemistry C · 2024-01-01

    Inhong Hwang, Minki Choe, Dahui Jeon, In-Hwan Baek

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  18. Remarkable Bias‐Stress Stability of Ultrathin Atomic‐Layer‐Deposited Indium Oxide Thin‐Film Transistors Enabled by Plasma Fluorination

    Advanced Functional Materials · 2024-06-09

    Jinxiong Li, Shanshan Ju, Yupu Tang, Jiye Li, Xiao Li, Xu Tian, Jianzhang Zhu, Qingqin Ge, Lei Lü, Shengdong Zhang, Xinwei Wang

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  19. Optimized hydrogen-supplying gate insulator for high-mobility indium oxide TFTs via atomic-level oxygen reactant engineering

    Journal of Alloys and Compounds · 2025-02-21

    Hwa Young Kim, Seong‐In Cho, Dong Yeob Shin, Kwun‐Bum Chung, Sang‐Hee Ko Park, Jong Beom Ko

    Read original paper ↗ ·
  20. Simultaneously enhanced mobility and stability in In2O3 thin-film transistor by nitrogen modification

    Journal of Applied Physics · 2025-08-05

    Wengao Pan, Kaijie Gu, Meijin Zhao, Lei Xu, Wenwu Pan, Liye Xiao, Suyang Sun, Hailin Jing, Zhiyuan Zhu, Ying Li

    Read original paper ↗ ·
  21. Decoupling Reversible Interface Trapping and Irreversible Bulk Transitions in Solution-Processed Indium Zinc Oxide Thin-Film Transistors

    Nanomaterials · 2026-07-16

    Dongwook Kim, Hyunji Shin, Hyeonju Lee, Youngjun Yun, Jin‐Hyuk Bae, Jaehoon Park

    Read original paper ↗ ·
  22. Next-generation materials and devices by combustion processes

    Progress in Materials Science · 2026-10-01

    Alexander S. Mukasyan, Khachatur V. Manukyan, Eirini Goudeli, Sotiris E. Pratsinis, Christopher E. Shuck, Stefania Specchia

    Read original paper ↗ ·