RESEARCH PAPER · Nature Communications · 2026
Integration of high-κ oxide on 2D semiconductors with carbon-dot monolayer assembly as van der Waals interfacial layer
Sunny Wong, Fufei An, Yu Wu, Viet Hung Pham, Yanxiao Li, Robert L. Thompson, Junseok Lee, Kaijun Yin, Hanyu Hou, Yuan Gao, Jian‐Min Zuo, Congjun Wang, Christopher Matranga, Qing Ping Cao
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