RESEARCH PAPER · Energy Advances · 2025
Impact of precursor dosing on the surface passivation of AZO/AlO x stacks formed using atomic layer deposition
Yan Wang, Theodore D. C. Hobson, Jack E. N. Swallow, Shona McNab, John O’Sullivan, Anastasia H. Soeriyadi, Xinya Niu, Rebekah Fraser, Akash Dasgupta, Soumyajit Maitra, Pietro P. Altermatt, Robert S. Weatherup, Matthew Wright, Ruy S. Bonilla
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