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RESEARCH PAPER · Bulletin of the Korean Chemical Society · 2023

Predicting photoresist sensitivity using machine learning

BALAJI GAUTAM GHULE, Min-Kyeong Kim, Ji‐Hyun Jang

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9 direct citing papers in this saved network. Explore the next layer with second-order citations.

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Predicting photoresist sensitivity using machine learningOriginalMolecular structural descriptor‐assisted machine learning for organic photovoltaics with perylenediimide acceptors5SnSe : The rise of the ultrahigh thermoelectric performance material28Development of a machine‐learning model for microplastic analysis in an FT‐IR microscopy image25Predicting the formation enthalpy and phase stability of (Ti,Al,TM)N (TM = III-VIB group transition metals) by high-throughput ab initio calculations and machine learning9Novel approach for KrF chemically amplified resist optimization assisted by deep learning2First-principles study of metal and ligand substitution effects on EUV absorption and electron energy loss2Spatial Dynamics and Drivers of Urban Growth in Thua Thien Hue Province, Vietnam: Insights for Urban Sustainability in the Global South4Research on Optimization of Food Process Parameters Based on Machine Learning1Defining chemical problems for artificial intelligence models2

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  1. Molecular structural descriptor‐assisted machine learning for organic photovoltaics with perylenediimide acceptors

    Bulletin of the Korean Chemical Society · 2023-12-15

    Gyu‐Hee Kim, Keonho Yoon, Chihyung Lee, Minwoo Nam, Doo‐Hyun Ko

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  2. SnSe : The rise of the ultrahigh thermoelectric performance material

    Bulletin of the Korean Chemical Society · 2024-01-29

    Taeshik Kim, Hyungseok Lee, In Jae Chung

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  3. Development of a machine‐learning model for microplastic analysis in an FT‐IR microscopy image

    Bulletin of the Korean Chemical Society · 2024-03-07

    Eunwoo Choi, Yejin Choi, Hyoyoung Lee, Jae‐Woo Kim, Han Bin Oh

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  4. Predicting the formation enthalpy and phase stability of (Ti,Al,TM)N (TM = III-VIB group transition metals) by high-throughput ab initio calculations and machine learning

    Acta Materialia · 2024-06-25

    Jie Zhang, Yi Kong, Li Chen, Nikola Koutná, P.H. Mayrhofer

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  5. Novel approach for KrF chemically amplified resist optimization assisted by deep learning

    Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2024-12-01

    Chen Tang, Toshiaki Tanaka, Atsushi Sekiguchi, Yoshihiko Hirai, Masaaki Yasuda

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  6. First-principles study of metal and ligand substitution effects on EUV absorption and electron energy loss

    Journal of Materials Chemistry C · 2025-01-01

    Florian Brette, Vishal Gupta, Geunsik Lee

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  7. Spatial Dynamics and Drivers of Urban Growth in Thua Thien Hue Province, Vietnam: Insights for Urban Sustainability in the Global South

    ISPRS International Journal of Geo-Information · 2025-01-25

    Olabisi S. Obaitor, Oluwafemi Michael Odunsi, Thanh Bien Vu, Lena C. Grobusch, Michael Schultz, Volker Hochschild, Linh Nguyen Hoang Khanh, Matthias Garschagen

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  8. Research on Optimization of Food Process Parameters Based on Machine Learning

    Unknown journal · 2025-05-09

    Xiangjun Chen, Qinhong Shi

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  9. Defining chemical problems for artificial intelligence models

    Bulletin of the Korean Chemical Society · 2026-01-25

    Joonyoung F. Joung

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