RESEARCH ARTICLE · IEEE Electron Device Letters · 2022
Understanding the Effect of Oxygen Content on Ferroelectric Properties of Al-Doped HfO Thin Films
Zhenhai Li, Tianyu Wang, Yongkai Liu, Jiajie Yu, Jialin Meng, Pei Liu, Kangli Xu, Hao Zhu, Qingqing Sun, David Wei Zhang, Lin Chen
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