RESEARCH PAPER · Ceramics International · 2021
Y-doped HfO2 deposited by atomic layer deposition using a cocktail precursor for DRAM capacitor dielectric application
Jenam Kim, Byung Seok Kim, Aejin Lee, Dong Hee Han, Ji Hyeon Hwang, Youngjin Kim, Ki-Chang Song, Hansol Oh, Sangho Kim, Yongjoo Park, Woojin Jeon
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