RESEARCH PAPER · ACS Applied Materials & Interfaces · 2021
Role of ALD Al 2 O 3 Surface Passivation on the Performance of p-Type Cu 2 O Thin Film Transistors
Mari Napari, Tahmida N. Huq, David J. Meeth, Mikko Heikkilä, Kham Man Niang, Haiyan Wang, Tomi Iivonen, Haiyan Wang, Markku A. Leskelä, Mikko Ritala, Andrew John Flewitt, Robert L. Z. Hoye, Judith L. MacManus‐Driscoll
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