RESEARCH PAPER · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2007
Influence of the film properties on the plasma etching dynamics of rf-sputtered indium zinc oxide layers
Luc Stafford, Wootaek Lım, S. J. Pearton, M. Chicoine, Subhash C. Gujrathi, F. Schiettekatte, Jae-Soung Park, Ju-Il Song, Young-Woo Heo, Joon‐Hyung Lee, Jeong-Joo Kim, Ivan I. Kravchenko
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